1 March 1991 Dose control for short exposures in excimer laser lithography
Author Affiliations +
Proceedings Volume 1377, Excimer Laser Materials Processing and Beam Delivery Systems; (1991) https://doi.org/10.1117/12.25033
Event: Advances in Intelligent Robotics Systems, 1990, Boston, MA, United States
Abstract
As a result of progress in deep UV resists lasers and optics exposures well below 50 pulses are becoming routine. To maintain the degree of dose control required for linewidth control some means of pulse energy modulation is necessary during the course of an exposure. It is possible to achieve 1 dose control for exposures using as few as 6 pulses by relatively simple means. This paper will present a statistical analysis of some dose control methods along with some results of the application of energy modulation in excimer laser steppers.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard F. Hollman, Richard F. Hollman, } "Dose control for short exposures in excimer laser lithography", Proc. SPIE 1377, Excimer Laser Materials Processing and Beam Delivery Systems, (1 March 1991); doi: 10.1117/12.25033; https://doi.org/10.1117/12.25033
PROCEEDINGS
7 PAGES


SHARE
Back to Top