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1 April 1991 Effects of conductor losses on cross-talk in multilevel-coupled VLSI interconnections
T. Emilie van Deventer, Linda P.B. Katehi, Andreas C. Cangellaris
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Proceedings Volume 1389, Microelectronic Interconnects and Packages: Optical and Electrical Technologies; (1991) https://doi.org/10.1117/12.25530
Event: Advances in Intelligent Robotics Systems, 1990, Boston, MA, United States
Abstract
The influence of conductor losses on the cross-talk between coupled microstrip lines is evaluated using an integral equation method. In this mathematical formulation the fields are computed inside the conductors and are utilized to define an equivalent impedance on the surface of the strips. This surface impedance is used as a boundary condition for the solution of the electromagnetic problem outside the conductors. Following this procedure the effect of losses on pulse dispersion in coupled microstrip lines is studied thoroughly for various geometries.
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T. Emilie van Deventer, Linda P.B. Katehi, and Andreas C. Cangellaris "Effects of conductor losses on cross-talk in multilevel-coupled VLSI interconnections", Proc. SPIE 1389, Microelectronic Interconnects and Packages: Optical and Electrical Technologies, (1 April 1991); https://doi.org/10.1117/12.25530
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KEYWORDS
Very large scale integration
Electromagnetism
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