1 August 1991 Prototype of an excimer laser for microprocessing
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Proceedings Volume 1391, Laser Technology III; (1991) https://doi.org/10.1117/12.57189
Event: Laser Technology III, 1990, Szczecin, Poland
Abstract
The paper presents a brief description of a prototype of a XeC1 excimer laser for micraprocessing of materials. The planned main parameters of the laserare as follows: wavelength . . . . . . . . . . . . . . . . . . . . . . . . . 308 nm -''energyofapulse. . . . . . . . . . . . . lOOmJ -pulseduration (FWHM) . . . . . . . . . . . . . . . 2Ons repetition frequency . . . . . . . . . . . . . . 1O Hz peak power of a pulse . . . . . . . . . . . . . . . 5 MW With respect to currently carrried works with the prototype we show only preliminary results of testing of a laser head. The obtained maximum laser pulse energy exceeded 90 ml. However it should be pointed out that this value was obtained without any opt i mi z at i on of the 1 aser.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Leszek Iwanejko, Leszek Iwanejko, Ludwik Jerzy Pokora, Ludwik Jerzy Pokora, Wieslaw L. Wolinski, Wieslaw L. Wolinski, } "Prototype of an excimer laser for microprocessing", Proc. SPIE 1391, Laser Technology III, (1 August 1991); doi: 10.1117/12.57189; https://doi.org/10.1117/12.57189
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