Characterization of plasma processes with optical emission spectroscopy

Douglas S. Malchow

doi:10.1117/12.48942

1 March 1991 Characterization of plasma processes with optical emission spectroscopy

Douglas S. Malchow

Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48942
Event: Processing Integration, 1990, Santa Clara, CA, United States

Abstract

Real-time multi-channel Optical Emission Spectroscopy was used to record then analyze a color change in an argon plasma. It is shown to be an effective diagnostic tool with value as an on-line monitor where it can be used to call process endpoint while simultaneously testing for undesirable conditions.

Citation Download Citation

Douglas S. Malchow "Characterization of plasma processes with optical emission spectroscopy", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); https://doi.org/10.1117/12.48942

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