1 March 1991 Characterization of plasma processes with optical emission spectroscopy
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Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48942
Event: Processing Integration, 1990, Santa Clara, CA, United States
Abstract
Real-time multi-channel Optical Emission Spectroscopy was used to record then analyze a color change in an argon plasma. It is shown to be an effective diagnostic tool with value as an on-line monitor where it can be used to call process endpoint while simultaneously testing for undesirable conditions.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Douglas S. Malchow, Douglas S. Malchow, } "Characterization of plasma processes with optical emission spectroscopy", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48942; https://doi.org/10.1117/12.48942
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