1 March 1991 Characterization of plasma processes with optical emission spectroscopy
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Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48942
Event: Processing Integration, 1990, Santa Clara, CA, United States
Abstract
Real-time multi-channel Optical Emission Spectroscopy was used to record then analyze a color change in an argon plasma. It is shown to be an effective diagnostic tool with value as an on-line monitor where it can be used to call process endpoint while simultaneously testing for undesirable conditions.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Douglas S. Malchow, Douglas S. Malchow, "Characterization of plasma processes with optical emission spectroscopy", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); doi: 10.1117/12.48942; https://doi.org/10.1117/12.48942
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