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1 March 1991 Self-aligned synthesis of titanium silicide by multipulse excimer laser irradiation
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Proceedings Volume 1392, Advanced Techniques for Integrated Circuit Processing; (1991) https://doi.org/10.1117/12.48953
Event: Processing Integration, 1990, Santa Clara, CA, United States
Abstract
We present (report) a new type of titanium suicide self-aligned synthesis based upon excimer laser irradiation. This new process relaxes the requirements for ambient atmosphere control and suppresses the unwanted lateral growth of the silicide.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Valentin Craciun, Doina Craciun, Ion N. Mihailescu, A. V. Kuzmichov, Vitali I. Konov, and S. A. Uglov "Self-aligned synthesis of titanium silicide by multipulse excimer laser irradiation", Proc. SPIE 1392, Advanced Techniques for Integrated Circuit Processing, (1 March 1991); https://doi.org/10.1117/12.48953
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