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1 April 1991 Adaptive process control for a rapid thermal processor
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Proceedings Volume 1393, Rapid Thermal and Related Processing Techniques; (1991) https://doi.org/10.1117/12.25722
Event: Processing Integration, 1990, Santa Clara, CA, United States
Abstract
PD (Proportional Integrated Derivative) controllers applied to temperature regulation in a rapid thermal processor are first presented. The setting method of the control parameters together with the corresponding experimental results is given. Evidence in favour of parameter dynamic adjustment is demonstrated. A new algorithm based upon parameter scheduling and providing enlarged control capability is then presented and tested with various wafers and processors. At last insights about closed loop self-tuning using Generalized Predictive Control algorithm are given and the corresponding results discussed. 1.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean-Marie R. Dilhac, Christian Ganibal, J. Bordeneuve, B. Dahhou, L. Amat, and Antoni Picard "Adaptive process control for a rapid thermal processor", Proc. SPIE 1393, Rapid Thermal and Related Processing Techniques, (1 April 1991); https://doi.org/10.1117/12.25722
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