1 March 1991 Pulsed-laser deposition of YBa2Cu3O7-x thin films: processing, properties, and performance
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Abstract
One and two inch diameter wafers of (100) LaAlO3 have been coated with thin films of YBa2Cu3O7_ by a pulsed laser deposition technique. Deposition parameters have been optimized to produce uniform, 90 K films which have surface resistance values between 0.4 and 0.8 mμ at 4 K and 22 GHz.
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Ross E. Muenchausen, Ross E. Muenchausen, Stephen R. Foltyn, Stephen R. Foltyn, Xin Di Wu, Xin Di Wu, Robert C. Dye, Robert C. Dye, Nicholas S. Nogar, Nicholas S. Nogar, A. H. Carim, A. H. Carim, F. Heidelbach, F. Heidelbach, D. Wayne Cooke, D. Wayne Cooke, Robert C. Taber, Robert C. Taber, Rod K. Quinn, Rod K. Quinn, } "Pulsed-laser deposition of YBa2Cu3O7-x thin films: processing, properties, and performance", Proc. SPIE 1394, Progress In High-Temperature Superconducting Transistors and Other Devices, (1 March 1991); doi: 10.1117/12.25751; https://doi.org/10.1117/12.25751
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