1 February 1991 Pulsed HF chemical laser using a VUV phototriggered discharge
Author Affiliations +
Proceedings Volume 1397, 8th Intl Symp on Gas Flow and Chemical Lasers; (1991) https://doi.org/10.1117/12.25955
Event: Eighth International Symposium on Gas-Flow and Chemical Lasers, 1990, Madrid, Spain
Abstract
A simple corona phototriggered discharge has been operated in SF6/C2H6/Ne mixture at typical pressures 90-110 Torr, deposited energies up to 180 J/l and has resulted in the production of high energy HF laser pulse aroung 2.8 ?m. The maximum laser energy was 3.8 J per pulse which corresponds to a specific energy of 7 J/liter and to an efficiency of 4 % based upon the energy stored on the sustaining capacitor. Results of discharge modeling have shown that F atoms were mainly produced by electron excitation of SF6 dissociative electronic states.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henri Brunet, Michel Mabru, J. Rocca Serra, C. Vannier, "Pulsed HF chemical laser using a VUV phototriggered discharge", Proc. SPIE 1397, 8th Intl Symp on Gas Flow and Chemical Lasers, (1 February 1991); doi: 10.1117/12.25955; https://doi.org/10.1117/12.25955
PROCEEDINGS
4 PAGES


SHARE
Back to Top