1 February 1991 Pulsed HF chemical laser using a VUV phototriggered discharge
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Proceedings Volume 1397, 8th Intl Symp on Gas Flow and Chemical Lasers; (1991) https://doi.org/10.1117/12.25955
Event: Eighth International Symposium on Gas-Flow and Chemical Lasers, 1990, Madrid, Spain
Abstract
A simple corona phototriggered discharge has been operated in SF6/C2H6/Ne mixture at typical pressures 90-110 Torr, deposited energies up to 180 J/l and has resulted in the production of high energy HF laser pulse aroung 2.8 ?m. The maximum laser energy was 3.8 J per pulse which corresponds to a specific energy of 7 J/liter and to an efficiency of 4 % based upon the energy stored on the sustaining capacitor. Results of discharge modeling have shown that F atoms were mainly produced by electron excitation of SF6 dissociative electronic states.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henri Brunet, Henri Brunet, Michel Mabru, Michel Mabru, J. Rocca Serra, J. Rocca Serra, C. Vannier, C. Vannier, } "Pulsed HF chemical laser using a VUV phototriggered discharge", Proc. SPIE 1397, 8th Intl Symp on Gas Flow and Chemical Lasers, (1 February 1991); doi: 10.1117/12.25955; https://doi.org/10.1117/12.25955
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