UV laser-induced photofragmentation and photoionization of dimethylcadmium chemisorbed on silicon

Alexander P. Simonov; Vladimir N. Varakin; Anatoly M. Panesh

doi:10.1117/12.45110

1 March 1991 UV laser-induced photofragmentation and photoionization of dimethylcadmium chemisorbed on silicon

Alexander P. Simonov, Vladimir N. Varakin, Anatoly M. Panesh

Proceedings Volume 1436, Photochemistry and Photoelectrochemistry of Organic and Inorganic Molecular Thin Films; (1991) https://doi.org/10.1117/12.45110
Event: Optics, Electro-Optics, and Laser Applications in Science and Engineering, 1991, Los Angeles, CA, United States

Abstract

The behavior of dimethylcadmium (DMCd) molecules chemisorbed on n-type Si(100) with native oxide in ultrahigh vacuum conditions at room temperature and the photoprocesses in the adlayer induced by resonant excitation of DMCd by KrCl laser pulses have been studied using desorption mass spectroscopy. 222 nm irradiation resulted in both the efficient complete dissociation of the initially adsorbed organometallic molecules and the photoionization of fragments desorbed from the substrate surface. One-photon release of methyl radicals from chemisorbed DMCd species was observed. The nature of adsorbed species and the mechanisms of photoprocesses are discussed.

Citation Download Citation

Alexander P. Simonov, Vladimir N. Varakin, and Anatoly M. Panesh "UV laser-induced photofragmentation and photoionization of dimethylcadmium chemisorbed on silicon", Proc. SPIE 1436, Photochemistry and Photoelectrochemistry of Organic and Inorganic Molecular Thin Films, (1 March 1991); https://doi.org/10.1117/12.45110

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