Damage threshold measurements of reflective and transmissive optics at 130 nm

C. H. Muller III

doi:10.1117/12.2294448

1 November 1990 Damage threshold measurements of reflective and transmissive optics at 130 nm

C. H. Muller III

Proceedings Volume 1438, Laser-Induced Damage in Optical Materials 1989; 143813 (1990) https://doi.org/10.1117/12.2294448
Event: Laser-Induced Damage in Optical Materials 1989, 1989, Boulder, CO, United States

Abstract

The GLORIA VUV facility at Spectra Technology, Inc. has been used to measure the damage threshold and reflectivity of first surface Al+MgF2 mirrors and second surface MgF2+Al+MgF2 mirrors. The mirrors were illuminated by high power VUV coherent radiation at 130 nm. Mirror reflectivity was monitored for several thousand pulses for each optic studied. Two nanosecond long pulses and energy densities as high as 20 mJ cm-2 were used for the measurements. In addition, measurements of "color center" formation rates in transmissive optics have been obtained. The GLORIA VUV facility, experimental measurement system, and damage results will be discussed in detail.

Citation Download Citation

C. H. Muller III "Damage threshold measurements of reflective and transmissive optics at 130 nm", Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143813 (1 November 1990); https://doi.org/10.1117/12.2294448

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