1 November 1990 Angular dependence of thin-film dielectric coating damage thresholds revisited
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Abstract
Newnam et al. [1] reported experiments showing that the angular dependence of 351-nm laser damage thresholds in HfO2/SiO2 multilayer dielectric reflectors was much weaker than even the 1/cosh expected from simple geometric fluence dilution. Several plausible explanations were suggested, but none were convincing. We propose a simple geometric model based on a cylindrical form for the coating defect responsible for damage initiation. We have measured 248-nm damage thresholds for bare fused silica, evaporated aluminium films, and HfO2/SiO2 and A1203/SiO2 dielectric reflectors at angles out to 85°. The measured data agree well with our simple model.
© (1990) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
J. D. Boyer, J. D. Boyer, } "Angular dependence of thin-film dielectric coating damage thresholds revisited", Proc. SPIE 1438, Laser-Induced Damage in Optical Materials 1989, 143815 (1 November 1990); doi: 10.1117/12.2294450; https://doi.org/10.1117/12.2294450
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