1 June 1991 Fabrication and characterization of microwave-plasma-assisted chemical-vapor-deposited dielectric coatings
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A microwave plasma assisted chemical vapor deposition (MPACVD) process has been used to deposit modulated refractive index profile dielectric films to meet specific reflectance/transmittance coating characteristics. The MPACVD process has been proven to allow the deposition of dielectric thin films of excellent optical quality which have lower scatter and less strain than most conventional coatings. An important feature of the process is that both the deposition rate and the composition of the film can be adjusted under computer control during the deposition process. This degree of control allows the deposition of both graded and event more complicated refractive index profiles. The technique therefore allows the successful realization of highly sophisticated coating designs (e.g., Fourier). The process has been used to fabricate a range of dielectric designs, including narrow band high reflectivity coatings with minimal sidebands, using silicon oxynitride on fused silica substrates. This paper discusses aspects of the MPACVD process, including deposition rate, control, uniformity and deposition quality, the Fourier design program and the characteristics of a range of coating trials. The measurements made have included optical, laser and limited environmental testing.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roger M. Wood, Roger M. Wood, Adrian C. Greenham, Adrian C. Greenham, Bruce A. Nichols, Bruce A. Nichols, Noorallah Nourshargh, Noorallah Nourshargh, Keith L. Lewis, Keith L. Lewis, } "Fabrication and characterization of microwave-plasma-assisted chemical-vapor-deposited dielectric coatings", Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); doi: 10.1117/12.27523; https://doi.org/10.1117/12.27523

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