1 June 1991 Laser-induced damage of diamond films
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Abstract
The laser-induced damage thresholds of diamond films deposited on silicon substrates were investigated. Experiments were performed with both CW and pulsed lasers operating at a wavelength of 10. 6 jim. Analytical studies were conducted to determine the thermal and thermomechanical states as well as the electric field strengths of the films and the substrates at the damage thresholds in an effort to identify the damage mechanism. The evidence suggests that the diamond films are damaged by stress-induced cracking which occurs when the underlying silicon approaches melt. 1 .
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harold E. Read, Harold E. Read, M. Merker, M. Merker, Gerry A. Gurtman, Gerry A. Gurtman, Russell S. Wilson, Russell S. Wilson, } "Laser-induced damage of diamond films", Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); doi: 10.1117/12.27530; https://doi.org/10.1117/12.27530
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