Photoacoustic characterization of surface absorption

David W. Reicher; Scott R. Wilson; C. F. Kranenberg; M. Yasin Akhtar Raja; John Robert McNeil; Steven R. J. Brueck

doi:10.1117/12.27534

1 June 1991 Photoacoustic characterization of surface absorption

David W. Reicher, Scott R. Wilson, C. F. Kranenberg, M. Yasin Akhtar Raja, John Robert McNeil, Steven R. J. Brueck

Proceedings Volume 1441, Laser-Induced Damage in Optical Materials: 1990; (1991) https://doi.org/10.1117/12.27534
Event: Laser-Induced Damage in Optical Materials: 1990, 1990, Boulder, CO, United States

Abstract

Photoacoustic spectrososcopy is used to characterize the surface absorption of polished fused silica substrates and thin films deposited on fused silica substrates. The extreme sensitivity of this technique allows measurement of surface absorptions of a few tenths of a part per million. Characterization of samples with surfaces finished using a variety of methods is reported. Key words: Photoacoustic ion beam absorption thin films. 1.

Citation Download Citation

David W. Reicher, Scott R. Wilson, C. F. Kranenberg, M. Yasin Akhtar Raja, John Robert McNeil, and Steven R. J. Brueck "Photoacoustic characterization of surface absorption", Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); https://doi.org/10.1117/12.27534

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