1 August 1991 Thin-film technology in high-resolution, high-density AC plasma displays
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This paper introduces processing techniques for AC plasma display devices which we have used in the development of singlesubstrate full color plasma research display devices and more recently have utilized in the fabrication of our ribbed twin substrate devices. These techniques Include: (1) photolithographic liftoff for the generation of high conductivity electrode arrays (2) novel thickfilm depositions and processes for the generation of thick dielectric structures used in the formation of isolation barriers and for selective phosphor placement (3) multilayer depositions of thinfilm dielectrics suitable for the formation of active pixel regions with high capacitance. These techniques make possible the fabrication of large size high resolution high density full color devices with reduced parasitic capacitances minimal optical crosstalk and sufficient linear levels of gray scale for video applications.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nicholas C. Andreadakis, Nicholas C. Andreadakis, "Thin-film technology in high-resolution, high-density AC plasma displays", Proc. SPIE 1456, Large Screen Projection, Avionic, and Helmet-Mounted Displays, (1 August 1991); doi: 10.1117/12.45437; https://doi.org/10.1117/12.45437


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