1 July 1991 Etch conditions of photolithographic holograms
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Abstract
The authors have, on combining holography with photolithography, improved the etching conditions of making binary elements and produced photolithographic holograms which can yield continuous phase modulation. This paper points out that it is most important to strictly control the selection ratio of etching rates, and gives the curves of the etching rates in respect to the flow of etching gas in the case of constant response power. A proper working point has been found. As the applications of the curves, high-quality optical elements can be made.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongkang Guo, Yongkang Guo, Lurong Guo, Lurong Guo, Xiao-Chun Zhang, Xiao-Chun Zhang, "Etch conditions of photolithographic holograms", Proc. SPIE 1461, Practical Holography V, (1 July 1991); doi: 10.1117/12.44717; https://doi.org/10.1117/12.44717
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