An interference microscope is employed to take a photo of the interfering fringes, and its density is analyzed by a computer image system to measure the thickness distribution of a photolithographic hologram (PLH). This method is much more simple than that of SEM. The theory of measuring is presented in the paper. The authors measured the distributions of photolithographic gratings before and after the etching process. Comparing both the thickness distributions of corresponding recording layers, some primary rules of pattern transfer process by etching were identified.