1 July 1991 Comparison of 248-nm line narrowing resonator optics for deep-UV lithography lasers
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Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991); doi: 10.1117/12.44818
Event: Microlithography, 1991, San Jose, CA, United States
Abstract
Since 1987 commercial line narrowed 248 nm excimer lasers have been used with R&D DUV steppers. Several resonator concepts were employed to match linewidth power and lifetime needs for a DUV microlithography laser light source. The physics of different line narrowing resonators like prisms, grating, etalons and combinations are described and experimental lifetime and power capabilities reviewed. The directions of DUV-laser light source development are discussed in regard to 193 and 157 nm lithography.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hans-Juergen Kahlert, Ulrich Rebhan, Peter Lokai, Dirk Basting, "Comparison of 248-nm line narrowing resonator optics for deep-UV lithography lasers", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44818; https://doi.org/10.1117/12.44818
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KEYWORDS
Resonators

Deep ultraviolet

Excimer lasers

Optical lithography

Fabry–Perot interferometers

Lithography

Laser resonators

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