Effects of higher order aberrations on the process window

Joseph E. Gortych; David M. Williamson

doi:10.1117/12.44796

1 July 1991 Effects of higher order aberrations on the process window

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44796
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

High-quality imaging is essential for having the largest available process window for the various lithographic mask features, particularly those at the resolution limit of the lens. While lithographic lenses are designed to be 'diffraction limited,' shortcomings in the manufacturing process can introduce aberrations which affect imaging. The effects of such aberrations are explored via computer simulation, using exposure-defocus (E-D) diagrams and plots of linewidth versus focus for isolated and grouped lines. Data from a variety of lithographic lenses and the criteria for measuring lens performance are discussed.

Citation Download Citation

Joseph E. Gortych and David M. Williamson "Effects of higher order aberrations on the process window", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44796

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