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1 July 1991 Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications
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Abstract
Three types of phase-shifting mask designs are studied with respect to their suitability to print periodical L/S structures. The evaluation criteria are DOF, exposure latitude, linearity, and image contrast and slope of the intensity profile. Mask-making issues are also taken into account. The investigation is based on both simulations and experimental results. A fully transparent shifter causing an optical shift of 180 degrees is considered. A negative tone photoresist is used for the exposures with a KrF excimer laser stepper (248 nm).
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Maaike Op de Beeck, Akira Tokui, Masato Fujinaga, Nobuyuki Yoshioka, Kazuya Kamon, Tetsuro Hanawa, and Katsuhiro Tsukamoto "Improvement of focus and exposure latitude by the use of phase-shifting masks for DUV applications", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44781
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