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1 July 1991 Investigation of self-aligned phase-shifting reticles by simulation techniques
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Abstract
By means of simulation techniques using the SAMPLE and SPLAT programs the potential of self-aligned phase-shifting reticles for applications in microlithography is investigated and compared with conventional reticles and, to some extent, also with alternating and chromeless phase-shifter edge-line reticles. The analysis concentrates on partially coherent imaging ((sigma) equals0.5) of isolated spaces, line/space gratings and contact holes at k1 factors of 0.5 and 0.63, but wider and finer structures are also considered. The resist technique is found to have a considerable influence on the results. The work also includes a rough analysis of the necessary manufacturing tolerances of the phase reticles.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christoph Noelscher and Leonhard Mader "Investigation of self-aligned phase-shifting reticles by simulation techniques", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44798
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