1 July 1991 Multispot scanning exposure system for excimer laser stepper
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Abstract
A new type of spot scanning exposure system has been developed for an excimer laser stepper. To optimize exposure parameters, the authors developed a SIPSE (Simulator for Spot Scanning Exposure) and performed experiments with a He-Cd laser and a g-line lens. Applying the results, a prototype of an excimer laser exposure system was developed. A lens evaluation system has also been developed to adjust the lens elements in the projection lens. Using these systems, 0.35 micron line and space patterns were clearly resolved. SIPSE will be usable to optimize a phase-shifting exposure system with a potential for 0.25 micron patterns.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yasuhiro Yoshitake, Yoshitada Oshida, Tetsuzou Tanimoto, Minoru Tanaka, Minoru Yoshida, "Multispot scanning exposure system for excimer laser stepper", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44823; https://doi.org/10.1117/12.44823
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