New i-line lens for half-micron lithography

Kazuhiro Takahashi; Masakatsu Ohta; Toshiyuki Kojima; Miyoko Noguchi

doi:10.1117/12.44825

1 July 1991 New i-line lens for half-micron lithography

Kazuhiro Takahashi, Masakatsu Ohta, Toshiyuki Kojima, Miyoko Noguchi

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44825
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

In the last few years, i-line lithography has made remarkable progress. It is based on the development of high-contrast i-line resists and of high-NA lenses owing to improvement of the transmittance of glass for i-line. It is generally assumed that i-line steppers will play a major role in the production of 16 Mbit DRAMs. For half-micron production, CANON has developed a new i-line lens with a high NA of 0.52 and a wide image field 28.28 mm in diameter. This paper first reports on the image performance of this lens for half-micron, and then describes the distortion characteristics and magnification stability of the lens. In the last section, the possibility of i-line lithography of sub-half-micron referring to the experimental results on 0.4 micrometers L/S applications are discussed.

Citation Download Citation

Kazuhiro Takahashi, Masakatsu Ohta, Toshiyuki Kojima, and Miyoko Noguchi "New i-line lens for half-micron lithography", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44825

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