1 July 1991 Process optimization: a case study on the application of Taguchi methods in optical lithography
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Abstract
The implementation of statistical process control coupled with a failure mode evaluation analysis had failed to produce feature sizes consistently on the target of 5 micrometers . The process was in control but was not capable of delivering product consistently within specification. A Taguchi-type experiment was organized to maximize the process output. Several experiments were conducted varying just one factor at a time. This procedure identified (a) potential nonlinear response factors and (b) appropriate levels for the Taguchi experiment. Six important factors and one potential interaction (exposure and develop time) were identified. The L8 design of Taguchi's arrays was used and each experiment was repeated at both high and low humidities and different ambient temperatures. Significant factors and their appropriate levels were identified and the predicted response was 4.956 micrometers . The confirmatory runs averaged 5.005 microns.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Khalil I. Arshak, Eamonn Murphy, Arousian Arshak, "Process optimization: a case study on the application of Taguchi methods in optical lithography", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44812; https://doi.org/10.1117/12.44812
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