1 July 1991 Selected performance parameters and functional principles of a new stepper generation
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Abstract
Modern wafer stepper generations are capable of realizing higher circuit levels due to high-performance lenses in the WV region, but at the same time there is also the necessity of designing assembly groups of the wafer stepper so that they meet the requirements of a wide assortment range in modem device fabrication. Long years of practical experience in the use of steppers enabled Jenoptik to implement an new generation of wafer steppers, in which particular value was placed on the instrumental improvement of the paramemters: - internal thermostatting/minimum particle contamination - alignment accuracy - useful depth of focus.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karl-Heinz Kliem, Karl-Heinz Kliem, Volker Sczepanski, Volker Sczepanski, Uwe Michl, Uwe Michl, Reiner Hesse, Reiner Hesse, } "Selected performance parameters and functional principles of a new stepper generation", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); doi: 10.1117/12.44828; https://doi.org/10.1117/12.44828
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