1 July 1991 Half-micrometer linewidth metrology
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Abstract
This investigation studies linewidth metrology techniques and compares SEM measurement results with an electrical linewidth probe procedure. Calibration offsets between reticle, resist, etched, and electrical probe dimensions are compared for the 500-nm nominal isolated and grouped images. These individual probe-site measurements, as monitored with a low-voltage SEM through this process, are then compared to individual-site and full-field electrical data.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Stephen E. Knight, Dean C. Humphrey, Reginald R. Bowley, Robert M. Cogley, "Half-micrometer linewidth metrology", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); doi: 10.1117/12.44429; https://doi.org/10.1117/12.44429
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