1 July 1991 Metrology issues associated with submicron linewidths
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Abstract
The three conventional techniques--optical, low voltage scanning electron microscopy (LVSEM), and electrical linewidth measurement--continue to be employed, but each technique has unique applications, problems, and limitations. In this paper these techniques are investigated for submicron linewidth metrology. A great deal of emphasis is placed on the calibration of these tools and the potential for problems associated with the tools.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Khoi A. Phan, Khoi A. Phan, John L. Nistler, John L. Nistler, Bhanwar Singh, Bhanwar Singh, } "Metrology issues associated with submicron linewidths", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); doi: 10.1117/12.44455; https://doi.org/10.1117/12.44455
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