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Design and fabrication of soft x-ray photolithography experimental beam line at Beijing National Synchrotron Radiation Laboratory
Investigation on the effect of electron-beam acceleration voltage and electron-beam sharpness on 0.2-μm lines
Application of an electron-beam scattering parameter extraction method for proximity correction in direct-write electron-beam lithography
Mushroom-shaped gates defined by e-beam lithography down to 80-nm gate lengths and fabrication of pseudomorphic HEMTs with a dry-etched gate recess
Fine undercut control in bilayer PMMA-P(MMA-MAA) resist system for e-beam lithography with submicrometer resolution