DESIRE technology with electron-beam resists: fundamentals, experiments, and simulation

Dan V. Nicolau; Florin Fulga; Mircea V. Dusa

doi:10.1117/12.28466

1 August 1991 DESIRE technology with electron-beam resists: fundamentals, experiments, and simulation

Dan V. Nicolau, Florin Fulga, Mircea V. Dusa

Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.28466
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

The paper deals with the application of DESIRE techniques on e-beam lithography. The authors propose the basic statements for designing e-beam resists in order to apply properly the silylation method. The preliminary experiments with the designed resist prove the silylation capabilities of PMMA/P(tert-Butyl)MA copolymer. A mathematical model is built which emphasizes the role of Tg in diffusion. The simulation results are presented.

Citation Download Citation

Dan V. Nicolau, Florin Fulga, and Mircea V. Dusa "DESIRE technology with electron-beam resists: fundamentals, experiments, and simulation", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.28466

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