Defect repair for gold absorber/silicon membrane x-ray masks

Diane K. Stewart; Jacob Fuchs; Robert Allen Grant; Irving Plotnik

doi:10.1117/12.47344

1 August 1991 Defect repair for gold absorber/silicon membrane x-ray masks

Diane K. Stewart, Jacob Fuchs, Robert Allen Grant, Irving Plotnik

Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.47344
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

X-ray mask repair is a critical element in the commercialization of x-ray lithography. The purpose of this paper is to demonstrate routine repair of conventional defects on an x-ray mask and to test the repairs by exposure to an x-ray stepper.

Citation Download Citation

Diane K. Stewart, Jacob Fuchs, Robert Allen Grant, and Irving Plotnik "Defect repair for gold absorber/silicon membrane x-ray masks", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47344

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