Multilayer optics for soft x-ray projection lithography: problems and prospects

Daniel Gorman Stearns; Natale M. Ceglio; Andrew M. Hawryluk; Robert S. Rosen; Stephen P. Vernon

doi:10.1117/12.47345

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1 August 1991 Multilayer optics for soft x-ray projection lithography: problems and prospects

Daniel Gorman Stearns, Natale M. Ceglio, Andrew M. Hawryluk, Robert S. Rosen, Stephen P. Vernon

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Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.47345
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

The current state-of-the-art in multilayer x-ray optics is presented, and the specific problems posed by projection lithography are considered. To make soft x-ray projection lithography a viable technology, the multilayer optics must demonstrate both high normal incidence reflectivity and long-term stability in the potential hostile lithography environment.

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Daniel Gorman Stearns, Natale M. Ceglio, Andrew M. Hawryluk, Robert S. Rosen, and Stephen P. Vernon "Multilayer optics for soft x-ray projection lithography: problems and prospects", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47345

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