1 August 1991 Spherical pinch x-ray generator prototype for microlithography
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A new type of plasma x-ray source has been developed by applying the spherical pinch concept of imploding shock waves to produce a dense plasma hot enough to emit soft x-rays. Very intense x-rays in a few keV energy (5-10 angstroms) is radiated from a small plasma volume as microsecond pulses. SPX II is a prototype machine designed to demonstrate the engineering feasibility of the spherical pinch scheme. It is expected to generate at least 10 mJ/cm2 of usable soft x-rays for microlithography.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenji Kawai, Emilio Panarella, and D. Mostacci "Spherical pinch x-ray generator prototype for microlithography", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); doi: 10.1117/12.47366; https://doi.org/10.1117/12.47366

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