System design considerations for a production-grade, ESR-based x-ray lithography beamline

Stephen Kovacs; Dan Melore; Franco Cerrina; Richard K. Cole

doi:10.1117/12.47346

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1 August 1991 System design considerations for a production-grade, ESR-based x-ray lithography beamline

Stephen Kovacs, Dan Melore, Franco Cerrina, Richard K. Cole

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Proceedings Volume 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing; (1991) https://doi.org/10.1117/12.47346
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

As electron storage ring (ESR) based x-ray lithography technology moves closer to becoming an industrial reality, more and more attention has been devoted to studying problem areas related to its application in the production environment. A principle component is the x-ray lithography beamline (XLBL) and its associated design requirements. XLBL, an x-ray radiation transport system, is one of the three major subunits in the ESR-based x-ray lithography system (XLS) and has a pivotal role in defining performance characteristics of the entire XLS. Its major functions are to transport the synchrotron orbital radiation (SOR) to the lithography target area with defined efficiency and to modify SOR into the spectral distribution defined by the lithography process window. These functions must be performed reliably in order to satisfy the required high production rate and ensure 0.25 micron resolution lithography conditions. In this paper the authors attempt to answer some specific questions that arise during the formulation of an XLBL system design. Three principle issues that are essential to formulating a design are (1) Radiation transport efficiency, (2) X-ray optical configurations in the beamline, (3) Beamline system configurations. Some practical solutions to thee problem areas are presented, and the effects of these parameters on lithography production rate are examined.

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Stephen Kovacs, Dan Melore, Franco Cerrina, and Richard K. Cole "System design considerations for a production-grade, ESR-based x-ray lithography beamline", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47346

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