Critical dimension shift resulting from handling time variation in the track coat process

John M. Kulp

doi:10.1117/12.46411

1 June 1991 Critical dimension shift resulting from handling time variation in the track coat process

John M. Kulp

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46411
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A study was undertaken to determine if the critical dimension (CD) of a photoresist window varied due to variations in handling time between soft bake and the subsequent forced cool on a cool plate. A statistically significant shift in the CD was observed; the shift was correlated with the handling time variation with a confidence level of 90%. The trend of the observed shift at 42% relative humidity described a 0.0012 micrometers reduction in window dimension per second of added delay between soft bake and forced cool. Recommendations for optimum handling time control are identified for the conditions employed in this study; indications of optimum humidity for bake latitude are discussed.

Citation Download Citation

John M. Kulp "Critical dimension shift resulting from handling time variation in the track coat process", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46411

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