1 June 1991 Effect of sensitizer spatial distribution on dissolution inhibition in novolak/diazonaphthoquinone resists
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Abstract
The inhibition mechanism is novolak/diazonaphthoquinone resists is widely studied. We are interested in evaluating the effect of sensitizer distribution in the resist on the dissolution properties. Langmuir- Blodgett film deposition allows us to control the spatial distribution of sensitizer and thus evaluate its 'sphere of influence' on the dissolution inhibition of the novolak resin. We have performed both dissolution studies and lithographic studies on films with sensitizer deposition only on the surface as well as films with an embedded layer of sensitizer between two layers of novolak polymer. The surface layer films with one monolayer of sensitizer do not demonstrate any inhibitive properties unless the films are thermally treated. However, for the analogous embedded layer films, inhibition does occur without any baking of the samples. Also, in the lithographic studies, pattern contrast is improved considerably upon baking the samples; indicating that intimate interactions between resist components which may be induced by the thermal treatment is necessary for dissolution inhibition to take place.
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Veena Rao, Veena Rao, Laura L. Kosbar, Laura L. Kosbar, Curtis W. Frank, Curtis W. Frank, Roger Fabian W. Pease, Roger Fabian W. Pease, } "Effect of sensitizer spatial distribution on dissolution inhibition in novolak/diazonaphthoquinone resists", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46380; https://doi.org/10.1117/12.46380
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