Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists

Makoto Hanabata; F. Oi; Akihiro Furuta

doi:10.1117/12.46364

1 June 1991 Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists

Makoto Hanabata, F. Oi, Akihiro Furuta

Author Affiliations +

Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46364
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A new type of novolak resins is proposed for high performance positive photoresists. This novolak resin has a molecular weight distribution different from the existing materials and is characterized by its low content of middle molecular weight components. We call this novolak resin 'Tandem type novolak resin'. The positive photoresists that contain Tandem type novolak resins exhibit improved performance in resolution, sensitivity, and heat resistance which are usually balanced in trade-off relationships. The characteristics, syntheses, and advantages of Tandem type novolak resins are described. The mechanism of resist performance improvement will also be discussed.

Citation Download Citation

Makoto Hanabata, F. Oi, and Akihiro Furuta "Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46364

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