1 June 1991 Process control capability using a diaphragm photochemical dispense system
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This paper describes the methods and equipment which can be used to optimize the photochemical dispense process from a contamination and process control perspective. It describes the impact of point-of-use (POU) filtration on coating quality and gel removal; compares the performance of bellows and diaphragm pump designs for the dispensing of photoresist; and quantifies defect reduction studies using POU filtration of polyimide and spin-on-glass (SOG) photochemicals.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Terrell D. Cambria, Terrell D. Cambria, Scott F. Merrow, Scott F. Merrow, } "Process control capability using a diaphragm photochemical dispense system", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); doi: 10.1117/12.46415; https://doi.org/10.1117/12.46415

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