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1 June 1991 Progress in DUV resins
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Abstract
Starting from general arguments on the relation of polymer structure, transparency at 248 nm, resin hydrophilicity and resist dissolution characteristics, binder systems for novel DUV resists are presented, and the results of their lithographic evaluation are discussed. Phenolic polymers studied include homo- and copolymers of 2-, 3-, and 4- hydroxystyrenes and of their alkyl substituted derivatives for three- component systems, as well as 2- and 4-hydroxyphenylmethacrylates for use in two-component t-BOC-type resists. As an alternative nonphenolic resin, the performance of a maleimide/styrene copolymer in a two- component system is discussed.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Klaus Juergen Przybilla, Heinz Roeschert, Walter Spiess, Charlotte Eckes, Subhankar Chatterjee, Dinesh N. Khanna, Georg Pawlowski, and Ralph R. Dammel "Progress in DUV resins", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46368
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