1 March 1991 Application of a reduced area electrical test pattern to precise pattern registration measurements
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Abstract
A new reduced area electrically probed registration measurement pattern is described. The pattern is compatible with the Prometrix data acquisition and analysis system, and offers advantages over standard patterns in terms of patten area and versatility of use. The results of the application of the pattern to the measurement of reticle and stepper overlay are presented. With careful analysis of the data, inter- and intrafield reticle overlay errors are determined. Horizontal and vertical measurements of pattern placement within a single field and between fields showed an accuracy of greater than 67 nm and a repeatability of better than 14 nm (3 sigma).
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James P. Rominger, James P. Rominger, } "Application of a reduced area electrical test pattern to precise pattern registration measurements", Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); doi: 10.1117/12.29755; https://doi.org/10.1117/12.29755
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