1 March 1991 Sophisticated masks
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Abstract
Most photolithographic masks are made today using technology that has charged little from that licensed to the industry by Western Electric in 1975; even X-ray lithographic masks have changed little since then. This at first sight is extraordinary given that this same period spans the evolution of DRAMs by three orders of magnitude (from 4Kbit to 4M-bit) and the reduction of feature sizes nearly one order of magnitude.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Roger Fabian W. Pease, Roger Fabian W. Pease, Gerry Owen, Gerry Owen, Raymond Browning, Raymond Browning, Robert L. Hsieh, Robert L. Hsieh, Julienne Yu-Hey Lee, Julienne Yu-Hey Lee, Nadim I. Maluf, Nadim I. Maluf, C. Neil Berglund, C. Neil Berglund, } "Sophisticated masks", Proc. SPIE 1496, 10th Annual Symp on Microlithography, (1 March 1991); doi: 10.1117/12.29747; https://doi.org/10.1117/12.29747
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