1 October 1991 Optical characterization of photolithographic metal grids
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Proceedings Volume 1498, Tactical Infrared Systems; (1991) https://doi.org/10.1117/12.46819
Event: Southcentral '91 (Dallas), 1991, Dallas, TX, United States
Abstract
Infrared window materials for modern military aircraft must simultaneously provide adequate optical performance and maintain stringent shielding levels for electromagnetic interference (EMI). Microscopic metal grids deposited on the surface of dielectric windows can provide the conductivity necessary for proper radio frequency or RF shielding. This paper will examine the optical impact of three grid patterns designed for EMI suppression. Transmission blockage and beam diffraction in the far-field have been measured and compared to predicted values. A discussion of durability under severe thermal and rain erosion environments is also included.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kurt A. Osmer, Kurt A. Osmer, Mike Ivor Jones, Mike Ivor Jones, } "Optical characterization of photolithographic metal grids", Proc. SPIE 1498, Tactical Infrared Systems, (1 October 1991); doi: 10.1117/12.46819; https://doi.org/10.1117/12.46819
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