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1 September 1991 Applications of laser plasmas in XUV photoabsorption spectroscopy
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Proceedings Volume 1503, Excimer Lasers and Applications III; (1991)
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands
The measurement of photoionization cross-sections of free ions or refractory atoms is difficult as a suitable absorbing column must be produced and backlighted by a bright synchronized XUV-continuum emitting source. In the dual laser plasma (DLP) technique both the absorbing and backlighting plasmas are produced by the interaction of high-power laser beams with suitable solid targets. The authors describe some recent results obtained with the DLP technique. With a single-laser system and photographic detection, inner-shell excitations from both ground and excited states in Al and Si species up to the fourth stage of ionization have been recorded. New and unexpected results were obtained for La3+. By using a photoelectric-based multichannel detector and a synchronized multilaser system, the versatility and reliability of the DLP technique is greatly improved. Time-resolved spectra have been obtained for atomic Cr and Mn and their ions at photon energies between 40 and 70 eV where the dominant absorption mechanism is excitation of the 3p subshell. An intercomparison is made between results obtained with the DLP method and corresponding results recorded with alternative techniques. Preliminary results for atomic tungsten and platinum are shown.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eugene T. Kennedy, John T. Costello, and Jean-Paul Mosnier "Applications of laser plasmas in XUV photoabsorption spectroscopy", Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991);

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