1 September 1991 Light-induced polishing of evaporating surface
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Proceedings Volume 1503, Excimer Lasers and Applications III; (1991) https://doi.org/10.1117/12.46939
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands
Abstract
A theoretical model of surface polishing of materials evaporating by light from solid phase is proposed. On the basis of the model, an explanation is given for the experimentally observed phenomenon of diamond films surface polishing as a result of their graphitization and vaporization from solid phase under the action of multipulse radiation of an excimer XeCl laser. The proposed model of surface polishing by light can also be applied for the case of thermochemical etching by radiation where the rate of etching also has Arrhenius dependence on surface temperature. This new technique has promising possibilities in the processing of hard and superhard materials.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vladimir N. Tokarev, Vitali I. Konov, "Light-induced polishing of evaporating surface", Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); doi: 10.1117/12.46939; https://doi.org/10.1117/12.46939
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