1 September 1991 Low-loss line-narrowed excimer oscillator for projection photolithography: experiments and simulation
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Proceedings Volume 1503, Excimer Lasers and Applications III; (1991) https://doi.org/10.1117/12.46926
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands
Abstract
The short wavelength and high power of excimer lasers have made them attractive candidates as exposure sources for photolithography. Unfortunately, direct application of excimer lasers for microelectronic steppers is restricted by certain negative properties of the excimer laser radiation. This means that for the successful stepper's operation the radiation properties should be optimized. In this work the authors present the results of the optimization of the excimer laser characteristics for a deep-UV stepper.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Gennady S. Volkov, Gennady S. Volkov, D. Yu. Zaroslov, D. Yu. Zaroslov, } "Low-loss line-narrowed excimer oscillator for projection photolithography: experiments and simulation", Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); doi: 10.1117/12.46926; https://doi.org/10.1117/12.46926
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