1 August 1991 Electron-beam lithography for the microfabrication of OEICs
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Proceedings Volume 1506, Micro-Optics II; (1991) https://doi.org/10.1117/12.45958
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands
Abstract
The use of e-beam direct write lithography for the microfabrication of OEICs is demonstrated. Special design tools were developed for waveguide structures to enhance CAD and lithographic performance. Besides high resolution applications (e.g., gratings), e-beam lithography was used for three-dimensional resist shaping in order to develop waveguide tapers.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Herbert Engel, Herbert Engel, Walter Doeldissen, Walter Doeldissen, } "Electron-beam lithography for the microfabrication of OEICs", Proc. SPIE 1506, Micro-Optics II, (1 August 1991); doi: 10.1117/12.45958; https://doi.org/10.1117/12.45958
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