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1 November 1991 Formation of Si02 film on plastic substrate by liquid-phase-deposition method
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Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47296
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
The silicon dioxide (SiO2) film deposition on a plastic was made by liquid phase deposition (LPD) method. This process involves the deposition and growth of SiO2 layer on the plastic while immersing it in the hexafluorosilicic acid (H2SiF6) solution supersaturated with silica. In this study, it was shown that the specific pretreatment of the plastic surface by silane coupling agent was required for better adhesion of the SiO2 film. And the SiO2 film properties, resistance of organic solvent, water vapor permeability and water absorptivity, were evaluated in order to apply the 'LPD-SiO2' film to the protective layer of the polycarbonate (PC) disk for optical memory. As a result, it was shown that the 'LPD-SiO2' film could improve the properties of the plastic substrate.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaki Kitaoka, Hisao Honda, Harunobu Yoshida, Akio Takigawa, and Hideo Kawahara "Formation of Si02 film on plastic substrate by liquid-phase-deposition method", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47296
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