The diamond-like carbon films were successfully deposited onto Si, glass, Mo and stainless steel substrate at temperature less than 50 degrees C by dual-ion beam sputtering deposition. The influences of the bombarding ion beam energy, the bombarding ion beam current density and the ratio of hydrogen to argon gas flow in bombarding ion source on the properties and structures of films were investigated. It showed that the deposited films are composed of SP3 bond and SP2 bond with bond angle disorder. Depending on processing parameters and substrate, the predominant phase would be amorphous carbon, micro-graphite crystals or micro-cubic diamond crystals. With the increase of the parameters described above, the electrical resistivity of the films and the relative transmittance vs. wavelength curves of deposited glasses in IR region (1.5-5.5 µm) have tendency to increase first and then to decrease. The resistivities of the films deposited on Si, Mo and stainless steel range from 107 to 1012 (omega)cm. While on glass substrate, the square electrical resistivity varies from 105 to 109 (omega)/(box), the refractive index ranges from 1.1 to 2.6. The films and substrate have good adhesion force and the values between films and Si, Mo substrate are about 8 - 14 Kg/mm2. Combining the experimental conditions, the obtained results were disucssed.