1 November 1991 New approach to obtain uniform thickness ZnS thin film interference filters
Author Affiliations +
Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47259
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China
Abstract
In very large-scale integrated circuits, the switch of semiconductor elements has a very fast speed, but the information transfer speed is lower than that of the switch, thus deterring the whole computing speed. For optical elements, the ability to solve the problem is evident. This is supported by several facts: high switch and transfer speed and independent transfer of optical information. Using ZnS, Na3AlF6 interference filter as optical switch elements, the uniform thickness of thin film is essential to the optical parallel processing. The theoretic model for vacuum vapor thin film thickness distribution has been given with some assumptions. In view of the practical vapor condition and the vapor material, some modification is needed. By using an addendum as a limit to allow only some molecules to reach the surface of substrate, a uniform thickness thin film can then be obtained.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yuan Sheng Mei, Yuan Sheng Mei, Shi-Xuan Shang, Shi-Xuan Shang, Jin An Shan, Jin An Shan, Jian Gang Sun, Jian Gang Sun, } "New approach to obtain uniform thickness ZnS thin film interference filters", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); doi: 10.1117/12.47259; https://doi.org/10.1117/12.47259
PROCEEDINGS
4 PAGES


SHARE
RELATED CONTENT


Back to Top